Information card for entry 7006582

Structure parameters

• Formula: C20 H40 Li2 N6 Si2
• Calculated formula: C20 H40 Li2 N6 Si2
• SMILES: [Si]([N]12[Li]([N]1(C)C)([n]1ccccc1)[N]1([Si](C)(C)C)[Li]2([N]1(C)C)[n]1ccccc1)(C)(C)C
• Title of publication: Mixed hydrazido amido/imido complexes of tantalum, hafnium and zirconium: potential precursors for metal nitride MOCVD.
• Authors of publication: Baunemann, Arne; Kim, Younsoo; Winter, Manuela; Fischer, Roland A.
• Journal of publication: Dalton transactions (Cambridge, England : 2003)
• Year of publication: 2006
• Journal issue: 1
• Pages of publication: 121 - 128
• a: 9.063 ± 0.004 Å
• b: 19.277 ± 0.008 Å
• c: 8.088 ± 0.003 Å
• α: 90°
• β: 105.113 ± 0.01°
• γ: 90°
• Cell volume: 1364.2 ± 1 ų
• Cell temperature: 203 ± 2 K
• Ambient diffraction temperature: 203 ± 2 K
• Number of distinct elements: 5
• Space group number: 14
• Hermann-Mauguin space group symbol: P 1 21/c 1
• Hall space group symbol: -P 2ybc
• Residual factor for all reflections: 0.1023
• Residual factor for significantly intense reflections: 0.0545
• Weighted residual factors for significantly intense reflections: 0.1226
• Weighted residual factors for all reflections included in the refinement: 0.1404
• Goodness-of-fit parameter for all reflections included in the refinement: 1.088
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No