Crystallography Open Database

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Searching journal of publication like 'Journal of Materials Chemistry' volume of publication is 18

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7202179 CIFBa O2.68 Y0.1 Zr0.9P m -3 m4.19943; 4.19943; 4.19943
90; 90; 90
74.0578Azad, Abul K.; Savaniu, Cristian; Tao, Shanwen; Duval, Sophie; Holtappels, Peter; Ibberson, Richard M.; Irvine, John T. S.
Structural origins of the differing grain conductivity values in BaZr0.9Y0.1O2.95 and indication of novel approach to counter defect association
Journal of Materials Chemistry, 2008, 18, 3414
7202196 CIFC34 H38 N2 O5 P SP -112.042; 12.306; 11.691
95.75; 111.52; 83.2
1597.3Akutsu, Hiroki; Sato, Keiko; Yamashita, Shinji; Yamada, Jun-ichi; Nakatsuji, Shin'ichi; Turner, Scott S.
The first organic paramagnetic metal containing the aminoxyl radical
Journal of Materials Chemistry, 2008, 18, 3313
7202197 CIFC30 H34 N2 O5 S17P -112.436; 19.528; 9.326
97.06; 110.22; 83.44
2102.9Akutsu, Hiroki; Sato, Keiko; Yamashita, Shinji; Yamada, Jun-ichi; Nakatsuji, Shin'ichi; Turner, Scott S.
The first organic paramagnetic metal containing the aminoxyl radical
Journal of Materials Chemistry, 2008, 18, 3313
7202225 CIFC15 H20 O ZrP 1 21/n 17.6566; 14.2184; 12.4639
90; 91.546; 90
1356.4Black, Kate; Aspinall, Helen C.; Jones, Anthony C.; Przybylak, Katarzyna; Bacsa, John; Chalker, Paul R.; Taylor, Stephen; Zhao, Ce Zhou; Elliott, Simon D.; Zydor, Aleksandra; Heys, Peter N.
Deposition of ZrO2 and HfO2 thin films by liquid injection MOCVD and ALD using ansa-metallocene zirconium and hafnium precursors
Journal of Materials Chemistry, 2008, 18, 4561
7202226 CIFC15 H20 HfP 1 21/m 17.17; 9.053; 10.385
90; 91.14; 90
674Black, Kate; Aspinall, Helen C.; Jones, Anthony C.; Przybylak, Katarzyna; Bacsa, John; Chalker, Paul R.; Taylor, Stephen; Zhao, Ce Zhou; Elliott, Simon D.; Zydor, Aleksandra; Heys, Peter N.
Deposition of ZrO2 and HfO2 thin films by liquid injection MOCVD and ALD using ansa-metallocene zirconium and hafnium precursors
Journal of Materials Chemistry, 2008, 18, 4561

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