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Information card for entry 1504442
Preview
| Coordinates | 1504442.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C56 H70 N4 O4 |
|---|---|
| Calculated formula | C56 H70 N4 O4 |
| SMILES | c12nc(=Cc3ccc(C(=c4ccc(n4)C=c4ccc(=C1c1c(cccc1OCCC(C)(C)C)OCCC(C)(C)C)[nH]4)c1c(cccc1OCCC(C)(C)C)OCCC(C)(C)C)[nH]3)cc2 |
| Title of publication | The effect of molecular orientation on the potential of porphyrin-metal contacts. |
| Authors of publication | Nikiforov, Maxim P.; Zerweck, Ulrich; Milde, Peter; Loppacher, Christian; Park, Tae-Hong; Uyeda, H. Tetsuo; Therien, Michael J.; Eng, Lukas; Bonnell, Dawn |
| Journal of publication | Nano letters |
| Year of publication | 2008 |
| Journal volume | 8 |
| Journal issue | 1 |
| Pages of publication | 110 - 113 |
| a | 11.6721 ± 0.0002 Å |
| b | 19.915 ± 0.0005 Å |
| c | 21.9484 ± 0.0004 Å |
| α | 90° |
| β | 102.584 ± 0.001° |
| γ | 90° |
| Cell volume | 4979.34 ± 0.18 Å3 |
| Cell temperature | 200 ± 2 K |
| Ambient diffraction temperature | 200 ± 2 K |
| Number of distinct elements | 4 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for all reflections | 0.0852 |
| Residual factor for significantly intense reflections | 0.0738 |
| Weighted residual factors for all reflections | 0.176 |
| Weighted residual factors for significantly intense reflections | 0.1681 |
| Goodness-of-fit parameter for all reflections | 1.123 |
| Goodness-of-fit parameter for significantly intense reflections | 1.15 |
| Diffraction radiation wavelength | 0.71069 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/1504442.html
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Users of the data should acknowledge the original authors of the
structural data.