Information card for entry 1505672
| Formula |
C16 H29 Cl N4 O4 |
| Calculated formula |
C16 H29 Cl N4 O4 |
| SMILES |
[Cl-].O=C(Nc1cccc(c1N)C(=O)N)C1CC[NH+](CCC)CC1.O.O |
| Title of publication |
Process Development for ABT-472, a Benzimidazole PARP Inhibitor |
| Authors of publication |
Barkalow, Jufang H.; Breting, Jeffrey; Gaede, Bruce J.; Haight, Anthony R.; Henry, Rodger; Kotecki, Brian; Mei, Jianzhang; Pearl, Kurt B.; Tedrow, Jason S.; Viswanath, Shekhar K. |
| Journal of publication |
Organic Process Research & Development |
| Year of publication |
2007 |
| Journal volume |
11 |
| Journal issue |
4 |
| Pages of publication |
693 |
| a |
30.683 ± 0.005 Å |
| b |
30.683 ± 0.005 Å |
| c |
8.352 ± 0.002 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
7863 ± 3 Å3 |
| Cell temperature |
193 ± 2 K |
| Ambient diffraction temperature |
193 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
88 |
| Hermann-Mauguin space group symbol |
I 41/a :2 |
| Hall space group symbol |
-I 4ad |
| Residual factor for all reflections |
0.0658 |
| Residual factor for significantly intense reflections |
0.0563 |
| Weighted residual factors for significantly intense reflections |
0.152 |
| Weighted residual factors for all reflections included in the refinement |
0.1617 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.059 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/1505672.html