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Information card for entry 1520659
Preview
| Coordinates | 1520659.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C22 H32 Cl2 I2 Si2 |
|---|---|
| Calculated formula | C22 H26 Cl2 I2 Si2 |
| SMILES | I/C(=C(\Cl)c1c(c(ccc1)/C(=C(I)\[Si](C)(C)C)Cl)c1ccccc1)[Si](C)(C)C |
| Title of publication | Highly Regio- and Diastereoselective Formation of Tetrasubstituted (Z)-1,2-Dihaloalkenes from the Halogenation of Trimethylsilyl Alkynes with ICl. |
| Authors of publication | Sproul, Kyle C.; Chalifoux, Wesley A. |
| Journal of publication | Organic letters |
| Year of publication | 2015 |
| Journal volume | 17 |
| Journal issue | 13 |
| Pages of publication | 3334 - 3337 |
| a | 13.1915 ± 0.0004 Å |
| b | 9.4009 ± 0.0003 Å |
| c | 22.0383 ± 0.0006 Å |
| α | 90° |
| β | 106.275 ± 0.001° |
| γ | 90° |
| Cell volume | 2623.49 ± 0.14 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.0198 |
| Residual factor for significantly intense reflections | 0.0183 |
| Weighted residual factors for significantly intense reflections | 0.044 |
| Weighted residual factors for all reflections included in the refinement | 0.0446 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.087 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/1520659.html
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Users of the data should acknowledge the original authors of the
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