Information card for entry 1542430
| Formula |
C50 H32 N2 |
| Calculated formula |
C50 H32 N2 |
| SMILES |
n1(c2ccc(c3c4ccccc4c(c4ccccc34)c3ccc(n4c5ccccc5c5ccccc45)cc3)cc2)c2ccccc2c2ccccc12 |
| Title of publication |
Insight into the mechanism and outcoupling enhancement of excimer-associated white light generation |
| Authors of publication |
Chen, Ying-Hsiao; Tang, Kuo-Chun; Chen, Yi-Ting; Shen, Jiun-Yi; Wu, Yu-Sin; Liu, Shih-Hung; Lee, Chun-Shu; Chen, Chang-Hsuan; Lai, Tzu-Yu; Tung, Shih-Huang; Jeng, Ru-Jong; Hung, Wen-Yi; Jiao, Min; Wu, Chung-Chih; Chou, Pi-Tai |
| Journal of publication |
Chem. Sci. |
| Year of publication |
2016 |
| Journal volume |
7 |
| Journal issue |
6 |
| Pages of publication |
3556 |
| a |
12.8317 ± 0.0004 Å |
| b |
7.8512 ± 0.0003 Å |
| c |
17.4533 ± 0.0008 Å |
| α |
90° |
| β |
90.411 ± 0.002° |
| γ |
90° |
| Cell volume |
1758.27 ± 0.12 Å3 |
| Cell temperature |
295 ± 2 K |
| Ambient diffraction temperature |
295 ± 2 K |
| Number of distinct elements |
3 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/c 1 |
| Hall space group symbol |
-P 2ybc |
| Residual factor for all reflections |
0.1489 |
| Residual factor for significantly intense reflections |
0.059 |
| Weighted residual factors for significantly intense reflections |
0.1219 |
| Weighted residual factors for all reflections included in the refinement |
0.1587 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.017 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/1542430.html