Information card for entry 1550838
| Formula |
C34 H44 N4 O2 |
| Calculated formula |
C34 H44 N4 O2 |
| SMILES |
O=C1N(C2(c3c1c(N(C)C)ccc3)c1ccc(N(CC)CC)cc1Oc1cc(N(CC)CC)ccc21)CCCC |
| Title of publication |
A H-Bond Strategy to Develop Acid-Resistant Photoswitchable Rhodamine Spirolactams for Super-Resolution Single-Molecule Localization Microscopy |
| Authors of publication |
Qi, Qingkai; Chi, Weijie; Li, Yuanyuan; Qiao, Qinglong; Chen, Jie; Miao, Lu; Zhang, Yi; Li, Jin; Ji, Wei; Xu, Tao; Liu, Xiaogang; Yoon, Juyoung; Xu, Zhaochao |
| Journal of publication |
Chemical Science |
| Year of publication |
2019 |
| a |
11.0084 ± 0.0007 Å |
| b |
12.0389 ± 0.0007 Å |
| c |
12.2322 ± 0.0008 Å |
| α |
79.257 ± 0.005° |
| β |
66.321 ± 0.006° |
| γ |
78.199 ± 0.005° |
| Cell volume |
1443.4 ± 0.17 Å3 |
| Cell temperature |
130 ± 6 K |
| Ambient diffraction temperature |
130 ± 6 K |
| Number of distinct elements |
4 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.1224 |
| Residual factor for significantly intense reflections |
0.0665 |
| Weighted residual factors for significantly intense reflections |
0.1684 |
| Weighted residual factors for all reflections included in the refinement |
0.1948 |
| Goodness-of-fit parameter for all reflections included in the refinement |
0.969 |
| Diffraction radiation probe |
x-ray |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
Yes |
| Has Fobs |
No |
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The link is:
https://www.crystallography.net/1550838.html
