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Information card for entry 1552335
Preview
| Coordinates | 1552335.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C36 H84 Cl N2 Si4 Tm |
|---|---|
| Calculated formula | C36 H84 Cl N2 Si4 Tm |
| SMILES | [Tm](Cl)(N([Si](C(C)C)(C(C)C)C(C)C)[Si](C(C)C)(C(C)C)C(C)C)N([Si](C(C)C)(C(C)C)C(C)C)[Si](C(C)C)(C(C)C)C(C)C |
| Title of publication | Electronic Structures of Bent Lanthanide(III) Complexes with Two N-Donor Ligands |
| Authors of publication | Nicholas, Hannah; Vonci, Michele; Goodwin, Conrad Alexander Phillip; Loo, Song Wei; Murphy, Siobhan; Cassim, Daniel; Winpenny, Richard E. P.; McInnes, Eric J. L.; Chilton, Nicholas F.; Mills, David P. |
| Journal of publication | Chemical Science |
| Year of publication | 2019 |
| a | 15.8309 ± 0.0004 Å |
| b | 13.1077 ± 0.0003 Å |
| c | 22.5379 ± 0.0006 Å |
| α | 90° |
| β | 109.043 ± 0.003° |
| γ | 90° |
| Cell volume | 4420.8 ± 0.2 Å3 |
| Cell temperature | 100 ± 0.02 K |
| Ambient diffraction temperature | 100 ± 0.02 K |
| Number of distinct elements | 6 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for all reflections | 0.021 |
| Residual factor for significantly intense reflections | 0.0185 |
| Weighted residual factors for significantly intense reflections | 0.0468 |
| Weighted residual factors for all reflections included in the refinement | 0.0476 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.029 |
| Diffraction radiation probe | x-ray |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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Users of the data should acknowledge the original authors of the
structural data.