Information card for entry 1552388
| Formula |
C64 H78 S6 Si2 |
| Calculated formula |
C64 H78 S6 Si2 |
| Title of publication |
Computationally aided design of a high-performance organic semiconductor: the development of a universal crystal engineering core |
| Authors of publication |
Petty, Anthony J.; Ai, Qianxiang; Sorli, Jeni C.; Haneef, Hamna F.; Purdum, Geoffrey E.; Boehm, Alex; Granger, Devin B.; Gu, Kaichen; Rubinger, Carla Patricia Lacerda; Parkin, Sean R.; Graham, Kenneth R.; Jurchescu, Oana D.; Loo, Yueh-Lin; Risko, Chad; Anthony, John E. |
| Journal of publication |
Chemical Science |
| Year of publication |
2019 |
| a |
10.2642 ± 0.0002 Å |
| b |
17.5914 ± 0.0004 Å |
| c |
16.7475 ± 0.0004 Å |
| α |
90° |
| β |
91.721 ± 0.001° |
| γ |
90° |
| Cell volume |
3022.59 ± 0.12 Å3 |
| Cell temperature |
90 ± 0.2 K |
| Ambient diffraction temperature |
90 ± 0.2 K |
| Number of distinct elements |
4 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/n 1 |
| Hall space group symbol |
-P 2yn |
| Residual factor for all reflections |
0.0968 |
| Residual factor for significantly intense reflections |
0.0667 |
| Weighted residual factors for significantly intense reflections |
0.1767 |
| Weighted residual factors for all reflections included in the refinement |
0.201 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.043 |
| Diffraction radiation wavelength |
1.54178 Å |
| Diffraction radiation type |
CuKα |
| Has coordinates |
Yes |
| Has disorder |
Yes |
| Has Fobs |
No |
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https://www.crystallography.net/1552388.html