Information card for entry 1552738
| Formula |
C40 H36 Si2 |
| Calculated formula |
C40 H36 Si2 |
| SMILES |
[Si](C#Cc1c2ccccc2c(c2c(c3ccccc3c(c12)c1ccccc1)c1ccccc1)C#C[Si](C)(C)C)(C)(C)C |
| Title of publication |
Short Excited-State Lifetimes Enable Photo-Oxidatively Stable Rubrene Derivatives. |
| Authors of publication |
Ly, Jack; Martin, Kara; Thomas, Simil; Yamashita, Masataka; Yu, Beihang; Pointer, Craig A.; Yamada, Hiroko; Carter, Kenneth R.; Parkin, Sean; Zhang, Lei; Bredas, Jean-Luc; Young, Elizabeth R.; Briseno, Alejandro L. |
| Journal of publication |
The journal of physical chemistry. A |
| Year of publication |
2019 |
| Journal volume |
123 |
| Journal issue |
35 |
| Pages of publication |
7558 |
| a |
16.4701 ± 0.0004 Å |
| b |
10.2654 ± 0.0003 Å |
| c |
19.1679 ± 0.0005 Å |
| α |
90° |
| β |
93.01 ± 0.0015° |
| γ |
90° |
| Cell volume |
3236.29 ± 0.15 Å3 |
| Cell temperature |
90 ± 0.2 K |
| Ambient diffraction temperature |
90 ± 0.2 K |
| Number of distinct elements |
3 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/c 1 |
| Hall space group symbol |
-P 2ybc |
| Residual factor for all reflections |
0.0599 |
| Residual factor for significantly intense reflections |
0.0406 |
| Weighted residual factors for significantly intense reflections |
0.1037 |
| Weighted residual factors for all reflections included in the refinement |
0.1162 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.083 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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