Information card for entry 1554856
| Formula |
C20 H26 N2 O8 Si |
| Calculated formula |
C20 H26 N2 O8 Si |
| SMILES |
c1c(C(=O)O[C@@H]2CCC(=O)O[C@H]2/C=C/[Si](CC)(CC)CC)cc(N(=O)=O)cc1N(=O)=O.c1c(C(=O)O[C@H]2CCC(=O)O[C@@H]2/C=C/[Si](CC)(CC)CC)cc(N(=O)=O)cc1N(=O)=O |
| Title of publication |
Synthesis of functionalized γ-lactone via Sakurai exo-cyclization/rearrangement of 3,3-bis(silyl) enol ester with a tethered acetal. |
| Authors of publication |
Yin, Zhiping; Liu, Zengjin; Huang, Zhenggang; Chu, Yang; Chu, Zhiwen; Hu, Jia; Gao, Lu; Song, Zhenlei |
| Journal of publication |
Organic letters |
| Year of publication |
2015 |
| Journal volume |
17 |
| Journal issue |
6 |
| Pages of publication |
1553 - 1556 |
| a |
18.687 ± 0.007 Å |
| b |
6.709 ± 0.002 Å |
| c |
37.603 ± 0.013 Å |
| α |
90° |
| β |
90.534 ± 0.004° |
| γ |
90° |
| Cell volume |
4714 ± 3 Å3 |
| Cell temperature |
296 ± 2 K |
| Ambient diffraction temperature |
296.15 K |
| Number of distinct elements |
5 |
| Space group number |
15 |
| Hermann-Mauguin space group symbol |
C 1 2/c 1 |
| Hall space group symbol |
-C 2yc |
| Residual factor for all reflections |
0.1503 |
| Residual factor for significantly intense reflections |
0.0814 |
| Weighted residual factors for significantly intense reflections |
0.2045 |
| Weighted residual factors for all reflections included in the refinement |
0.2506 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.019 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
Yes |
| Has Fobs |
No |
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https://www.crystallography.net/1554856.html