Information card for entry 1555416
| Formula |
C18 H28 O4 Si |
| Calculated formula |
C18 H28 O4 Si |
| SMILES |
[Si](O[C@H]1[C@@]23[C@@](OC1)(CC[C@H]2C)[C@]1(C(=CC3)C(=O)OC1)C)(C)(C)C |
| Title of publication |
Protecting-Group-Free Total Synthesis of (-)-Jiadifenolide: Development of a [4 + 1] Annulation toward Multisubstituted Tetrahydrofurans. |
| Authors of publication |
Shen, Yang; Li, Linbin; Pan, Zhisheng; Wang, Yinglu; Li, Jundong; Wang, Kuangyu; Wang, Xiance; Zhang, Youyu; Hu, Tianhui; Zhang, Yandong |
| Journal of publication |
Organic letters |
| Year of publication |
2015 |
| Journal volume |
17 |
| Journal issue |
21 |
| Pages of publication |
5480 - 5483 |
| a |
7.2691 ± 0.0008 Å |
| b |
11.4811 ± 0.001 Å |
| c |
21.668 ± 0.002 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
1808.4 ± 0.3 Å3 |
| Cell temperature |
293 ± 2 K |
| Ambient diffraction temperature |
293 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
19 |
| Hermann-Mauguin space group symbol |
P 21 21 21 |
| Hall space group symbol |
P 2ac 2ab |
| Residual factor for all reflections |
0.0633 |
| Residual factor for significantly intense reflections |
0.0497 |
| Weighted residual factors for significantly intense reflections |
0.1263 |
| Weighted residual factors for all reflections included in the refinement |
0.1379 |
| Goodness-of-fit parameter for all reflections included in the refinement |
0.879 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/1555416.html