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Information card for entry 1569127
Preview
| Coordinates | 1569127.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C204 H188 N76 O66 U6 |
|---|---|
| Calculated formula | C204 H188 N76 O66 U6 |
| SMILES | C(=O)(c1ccc(cc1)C[n+]1ccc(cc1)c1ccncc1)O[U]12(=O)(=O)([O]3[U](=O)(=O)(O1)([OH2])([O]=C1N4C5C6N1CN1C(=O)N7CN8C(=O)N9CN%10C(=O)N%11C%12C%10N%10C(=O)N%12CN%12C(=[O][U]%13%14(=O)(=O)([O]%15[U](=O)(=O)(O%13)(OC(=O)c%13ccc(cc%13)C[n+]%13ccc(cc%13)c%13ccncc%13)([O]=C(c%13ccc(cc%13)C[n+]%13ccc(cc%13)c%13ccncc%13)O[U]%13%15(=O)(=O)(O%14)[O]=C(c%14ccc(cc%14)C[n+]%14ccc(cc%14)c%14ccncc%14)O%13)[OH2])[OH2])N%13CN%14C(=O)N%15CN%16C(=O)N%17CN%18C(=O)N(CN5C(=O)N6CN5C(=O)N(CN6C(=O)N(C%10)C9C86)C7C15)C1C%18N(C(=O)N1C4)CN1C(=O)N(CN4C(=O)N(CN5C(=O)N(C%11)C%12C%135)C%14C%154)C%16C%171)O[U]13(=O)(=O)([O]=C(O2)c2ccc(cc2)C[n+]2ccc(cc2)c2ccncc2)[O]=C(c2ccc(cc2)C[n+]2ccc(cc2)c2ccncc2)O1)[OH2].C1N2C(=O)N3CN4C(=O)N5CN6C(=O)N7CN8C(=O)N9C%10N%11C(=O)N(CN%12C(=O)N(CN%13C(=O)N(CN%14C(=O)N(C2C3%14)CN2C(=O)N3CN%14C(=O)N%15CN%16C(=O)N%17CN%18C(=O)N(C%11)C%11C%18N(CN%18C(=O)N(CN%19C(=O)N(CN%20C(=O)N1C2C3%20)C%14C%15%19)C%16C%17%18)C(=O)N%11C9)C4C5%13)C6C7%12)C8%10 |
| Title of publication | Colossal negative thermal expansion in a cucurbit[8]uril-enabled uranyl-organic polythreading framework <i>via</i> thermally induced relaxation. |
| Authors of publication | Jin, Qiu-Yan; Liang, Yuan-Yuan; Zhang, Zhi-Hui; Meng, Liao; Geng, Jun-Shan; Hu, Kong-Qiu; Yu, Ji-Pan; Chai, Zhi-Fang; Mei, Lei; Shi, Wei-Qun |
| Journal of publication | Chemical science |
| Year of publication | 2023 |
| Journal volume | 14 |
| Journal issue | 23 |
| Pages of publication | 6330 - 6340 |
| a | 50.442 ± 0.007 Å |
| b | 17.173 ± 0.002 Å |
| c | 36.609 ± 0.008 Å |
| α | 90° |
| β | 126.454 ± 0.009° |
| γ | 90° |
| Cell volume | 25507 ± 8 Å3 |
| Cell temperature | 260 K |
| Ambient diffraction temperature | 260 K |
| Number of distinct elements | 5 |
| Space group number | 15 |
| Hermann-Mauguin space group symbol | C 1 2/c 1 |
| Hall space group symbol | -C 2yc |
| Residual factor for all reflections | 0.0565 |
| Residual factor for significantly intense reflections | 0.0415 |
| Weighted residual factors for significantly intense reflections | 0.0942 |
| Weighted residual factors for all reflections included in the refinement | 0.1033 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.025 |
| Diffraction radiation wavelength | 0.71076 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/1569127.html
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