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Information card for entry 1569159
Preview
| Coordinates | 1569159.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C204 H188 N76 O66 U6 |
|---|---|
| Calculated formula | C204 H188 N76 O66 U6 |
| SMILES | C(=O)(c1ccc(cc1)C[n+]1ccc(cc1)c1ccncc1)O[U]12(=O)(=O)([O]3[U](=O)(=O)(O1)([O]=C1N4CN5C(=O)N6CN7C(=O)N8CN9C(=O)N%10CN%11C(=O)N%12CN%13C(=O)N%14CN%15C(=O)N%16CN%17C(=O)N%18CN1C1C4N4CN%19C5C6N(CN5C7C8N(CN6C(=O)N(CN7C(N(CN8C(=O)N(CN%20C(=O)N(CN%21C(=O)N(CN1C4=O)C%18C%17%21)C%16C%15%20)C%14C%138)C%12C%117)=[O][U]14(=O)(=O)[O]7[U](=O)(=O)(O1)(OC(=O)c1ccc(cc1)C[n+]1ccc(cc1)c1ccncc1)([O]=C(c1ccc(cc1)C[n+]1ccc(cc1)c1ccncc1)O[U]17(=O)(=O)(O4)[O]=C(c4ccc(cc4)C[n+]4ccc(cc4)c4ccncc4)O1)[OH2])C%10C96)C5=O)C%19=O)O[U]13(=O)(=O)(OC(=[O]2)c2ccc(cc2)C[n+]2ccc(cc2)c2ccncc2)[O]=C(c2ccc(cc2)C[n+]2ccc(cc2)c2ccncc2)O1)[OH2].C1N2C(=O)N3CN4C(=O)N5CN6C(=O)N7CN8C(=O)N9CN%10C(=O)N%11CN%12C(=O)N%13CN%14C(=O)N%15CN%16C(=O)N1C1N%17C(=O)N(CN%18C(=O)N(CN%19C(=O)N(CN%20C(=O)N(CN%21C(=O)N(CN%22C(=O)N(CN%23C(=O)N(CN%24C(=O)N(C2C3%24)C%17)C4C5%23)C6C7%22)C8C9%21)C%10C%11%20)C%12C%13%19)C%14C%15%18)C%161.O.O |
| Title of publication | Colossal negative thermal expansion in a cucurbit[8]uril-enabled uranyl-organic polythreading framework <i>via</i> thermally induced relaxation. |
| Authors of publication | Jin, Qiu-Yan; Liang, Yuan-Yuan; Zhang, Zhi-Hui; Meng, Liao; Geng, Jun-Shan; Hu, Kong-Qiu; Yu, Ji-Pan; Chai, Zhi-Fang; Mei, Lei; Shi, Wei-Qun |
| Journal of publication | Chemical science |
| Year of publication | 2023 |
| Journal volume | 14 |
| Journal issue | 23 |
| Pages of publication | 6330 - 6340 |
| a | 50.161 ± 0.003 Å |
| b | 17.165 ± 0.0012 Å |
| c | 36.082 ± 0.002 Å |
| α | 90° |
| β | 126.907 ± 0.002° |
| γ | 90° |
| Cell volume | 24842 ± 3 Å3 |
| Cell temperature | 300 ± 2 K |
| Ambient diffraction temperature | 300 K |
| Number of distinct elements | 5 |
| Space group number | 15 |
| Hermann-Mauguin space group symbol | C 1 2/c 1 |
| Hall space group symbol | -C 2yc |
| Residual factor for all reflections | 0.1068 |
| Residual factor for significantly intense reflections | 0.064 |
| Weighted residual factors for significantly intense reflections | 0.1552 |
| Weighted residual factors for all reflections included in the refinement | 0.1785 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.021 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/1569159.html
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