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Information card for entry 1569876
Preview
| Coordinates | 1569876.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C43 H30 F18 N4 O2 Si |
|---|---|
| Calculated formula | C43 H30 F18 N4 O2 Si |
| SMILES | [Si]12(Oc3c(N2c2c(F)c(F)c(F)c(F)c2F)c(F)c(F)c(F)c3F)(Oc2c(N1c1c(F)c(F)c(F)c(F)c1F)c(F)c(F)c(F)c2F)c1cn(c2c1cccc2)C.[NH+]1(C(C)(CCCC1(C)C)C)C |
| Title of publication | Reversible C-H bond silylation with a neutral silicon Lewis acid. |
| Authors of publication | Thorwart, Thaddäus; Greb, Lutz |
| Journal of publication | Chemical science |
| Year of publication | 2023 |
| Journal volume | 14 |
| Journal issue | 40 |
| Pages of publication | 11237 - 11242 |
| a | 19.1013 ± 0.0006 Å |
| b | 11.5155 ± 0.0003 Å |
| c | 19.3079 ± 0.0006 Å |
| α | 90° |
| β | 105.893 ± 0.001° |
| γ | 90° |
| Cell volume | 4084.6 ± 0.2 Å3 |
| Cell temperature | 100 K |
| Ambient diffraction temperature | 100 K |
| Number of distinct elements | 6 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for all reflections | 0.0456 |
| Residual factor for significantly intense reflections | 0.0425 |
| Weighted residual factors for significantly intense reflections | 0.1074 |
| Weighted residual factors for all reflections included in the refinement | 0.1099 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.027 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/1569876.html
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Users of the data should acknowledge the original authors of the
structural data.