Information card for entry 1576975
| Formula |
C46 H36 S3 Si2 |
| Calculated formula |
C46 H36 S3 Si2 |
| Title of publication |
Photochemical skeletal editing: one-step transformation of diaryl dithiophenes into regiodefined helicenes. |
| Authors of publication |
Shi, Xiaoli; Mei, Ling; Dong, Chenxi; Zhao, Chunmei; Chen, Chen; Xu, Yimin; Xu, Wan; Li, Chunli; Wang, Guangxia; Ma, Zhiying; Wang, Hua |
| Journal of publication |
Chemical science |
| Year of publication |
2026 |
| Journal volume |
17 |
| Journal issue |
20 |
| Pages of publication |
10082 - 10091 |
| a |
15.9945 ± 0.001 Å |
| b |
11.1752 ± 0.0007 Å |
| c |
21.4452 ± 0.001 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
3833.2 ± 0.4 Å3 |
| Cell temperature |
150 ± 2 K |
| Ambient diffraction temperature |
150 K |
| Number of distinct elements |
4 |
| Space group number |
29 |
| Hermann-Mauguin space group symbol |
P c a 21 |
| Hall space group symbol |
P 2c -2ac |
| Residual factor for all reflections |
0.1223 |
| Residual factor for significantly intense reflections |
0.0558 |
| Weighted residual factors for significantly intense reflections |
0.0869 |
| Weighted residual factors for all reflections included in the refinement |
0.1072 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.003 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/1576975.html
