Information card for entry 2006514
| Common name |
Bis(trichlorosilyl)ethane |
| Chemical name |
1,1,1,4,4,4-Hexachloro-1,4-disilabutane |
| Formula |
C2 H4 Cl6 Si2 |
| Calculated formula |
C2 H4 Cl6 Si2 |
| SMILES |
C([Si](Cl)(Cl)Cl)C[Si](Cl)(Cl)Cl |
| Title of publication |
1,1,1,4,4,4-Hexachloro-1,4-disilabutane |
| Authors of publication |
Mitzel, Norbert W.; Riede, Jürgen; Schmidbaur, Hubert |
| Journal of publication |
Acta Crystallographica Section C |
| Year of publication |
1997 |
| Journal volume |
53 |
| Journal issue |
9 |
| Pages of publication |
1335 - 1337 |
| a |
6.231 ± 0.001 Å |
| b |
9.447 ± 0.001 Å |
| c |
9.394 ± 0.001 Å |
| α |
90° |
| β |
92.32 ± 0.01° |
| γ |
90° |
| Cell volume |
552.52 ± 0.12 Å3 |
| Cell temperature |
205 ± 2 K |
| Ambient diffraction temperature |
293 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/n 1 |
| Hall space group symbol |
-P 2yn |
| Residual factor for all reflections |
0.0232 |
| Residual factor for significantly intense reflections |
0.019 |
| Weighted residual factors for all reflections |
0.0619 |
| Weighted residual factors for significantly intense reflections |
0.05 |
| Goodness-of-fit parameter for all reflections |
1.12 |
| Goodness-of-fit parameter for significantly intense reflections |
1.145 |
| Diffraction radiation wavelength |
0.71069 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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