Information card for entry 2010856
| Formula |
C32 H56 O6 S2 Si |
| Calculated formula |
C32 H56 O6 S2 Si |
| SMILES |
S1CCCSC1(C[C@H]1O[C@H](CC(OC)(OC)C1)COCc1ccccc1)C(C)(C)[C@@H](O[Si](C)(C)C(C)(C)C)CCO |
| Title of publication |
({-})-(3<i>S</i>)-4-(2-{[4,4-Dimethoxy-6-(benzyloxymethyl)perhydropyran-2-yl]methyl}-1,3-dithian-2-yl)-4-methyl-3-(1,1,2,2-tetramethyl-1-silapropoxy)pentan-1-ol |
| Authors of publication |
Hosomi, Hiroyuki; Ohba, Shigeru; Ohmori, Ken; Obitsu, Tetsuo; Ogawa, Yasuyuki; Ishikawa, Yuichi; Yamamura, Shosuke; Nishiyama, Shigeru |
| Journal of publication |
Acta Crystallographica Section C |
| Year of publication |
2000 |
| Journal volume |
56 |
| Journal issue |
4 |
| Pages of publication |
e140 - e141 |
| a |
6.878 ± 0.003 Å |
| b |
19.658 ± 0.003 Å |
| c |
26.493 ± 0.002 Å |
| α |
90° |
| β |
91.33 ± 0.02° |
| γ |
90° |
| Cell volume |
3581.1 ± 1.7 Å3 |
| Cell temperature |
298 ± 1 K |
| Number of distinct elements |
5 |
| Space group number |
4 |
| Hermann-Mauguin space group symbol |
P 1 21 1 |
| Hall space group symbol |
P 2yb |
| Residual factor for significantly intense reflections |
0.051 |
| Weighted residual factors for all reflections included in the refinement |
0.13 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.02 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
Yes |
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https://www.crystallography.net/2010856.html