Information card for entry 2011070
| Chemical name |
N-Phenyl-8-oxa-9-aza-1,4,4-trimethylbicyclo[3.2.2]non-6-en-one |
| Formula |
C16 H19 N O2 |
| Calculated formula |
C16 H19 N O2 |
| SMILES |
O1N([C@@H]2C=C[C@]1(C(=O)CC2(C)C)C)c1ccccc1.O1N([C@H]2C=C[C@@]1(C(=O)CC2(C)C)C)c1ccccc1 |
| Title of publication |
1,4,4-Trimethyl-9-phenyl-8-oxa-9-azabicyclo[3.2.2]non-6-en-2-one |
| Authors of publication |
Russi, Silvia; Pardo, Helena; Heinzen, Horacio; Dias, Eduardo; Moyna, Patrick; Mariezcurrena, Raúl A.; Suescun, Leopoldo; Mombrú, Alvaro W. |
| Journal of publication |
Acta Crystallographica Section C |
| Year of publication |
2000 |
| Journal volume |
56 |
| Journal issue |
6 |
| Pages of publication |
672 - 673 |
| a |
10.417 ± 0.003 Å |
| b |
8.263 ± 0.002 Å |
| c |
16.5049 ± 0.0012 Å |
| α |
90° |
| β |
92.746 ± 0.011° |
| γ |
90° |
| Cell volume |
1419 ± 0.5 Å3 |
| Cell temperature |
293 ± 2 K |
| Ambient diffraction temperature |
293 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/n 1 |
| Hall space group symbol |
-P 2yn |
| Residual factor for all reflections |
0.0989 |
| Residual factor for significantly intense reflections |
0.0422 |
| Weighted residual factors for all reflections included in the refinement |
0.1393 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.027 |
| Diffraction radiation wavelength |
0.71069 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
Yes |
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