Information card for entry 2020462
| Chemical name |
(+)-2-({[(1<i>S</i>,2<i>S</i>,3<i>S</i>,5<i>R</i>)-2,6,6-Trimethylbicyclo[3.1.1]hept-3-yl]imino}methyl}naphthalene |
| Formula |
C21 H25 N |
| Calculated formula |
C21 H25 N |
| SMILES |
N(=C\c1cc2ccccc2cc1)/[C@@H]1[C@H]([C@H]2C([C@@H](C1)C2)(C)C)C |
| Title of publication |
Crystal structures of ten enantiopure Schiff bases bearing a naphthyl group |
| Authors of publication |
Hernández-Téllez, Guadalupe; Moreno, Gloria E.; Bernès, Sylvain; Mendoza, Angel; Portillo, Oscar; Sharma, Pankaj; Gutiérrez, René |
| Journal of publication |
Acta Crystallographica Section E Crystallographic Communications |
| Year of publication |
2016 |
| Journal volume |
72 |
| Journal issue |
4 |
| Pages of publication |
583 |
| a |
6.32427 ± 0.00018 Å |
| b |
14.4559 ± 0.0003 Å |
| c |
18.5421 ± 0.0005 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
1695.17 ± 0.08 Å3 |
| Cell temperature |
150 ± 1 K |
| Ambient diffraction temperature |
150 ± 1 K |
| Number of distinct elements |
3 |
| Space group number |
19 |
| Hermann-Mauguin space group symbol |
P 21 21 21 |
| Hall space group symbol |
P 2ac 2ab |
| Residual factor for all reflections |
0.0526 |
| Residual factor for significantly intense reflections |
0.0407 |
| Weighted residual factors for significantly intense reflections |
0.0956 |
| Weighted residual factors for all reflections included in the refinement |
0.1032 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.034 |
| Diffraction radiation wavelength |
1.54184 Å |
| Diffraction radiation type |
CuKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
Yes |
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https://www.crystallography.net/2020462.html