Information card for entry 2218483
| Common name |
(-)-Kolavenic acid |
| Chemical name |
(<i>E</i>)-3-methyl-5-(1,2,4a,5-tetramethyl-1,2,3,4,4a,7,8,8a-\ octahydronaphthalen-1-yl)pent-2-enoic acid |
| Formula |
C20 H32 O2 |
| Calculated formula |
C20 H32 O2 |
| SMILES |
OC(=O)/C=C(CC[C@]1([C@@H](CC[C@]2(C(=CCC[C@H]12)C)C)C)C)\C |
| Title of publication |
({-})-Kolavenic acid |
| Authors of publication |
Zukerman-Schpector, Julio; Sousa Madureira, Lucas; Messiano, Gisele B.; Lopes, Lucia M. X.; Tiekink, Edward R. T. |
| Journal of publication |
Acta Crystallographica Section E |
| Year of publication |
2008 |
| Journal volume |
64 |
| Journal issue |
6 |
| Pages of publication |
o1114 |
| a |
12.5122 ± 0.0003 Å |
| b |
15.5439 ± 0.0004 Å |
| c |
19.1969 ± 0.0004 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
3733.57 ± 0.15 Å3 |
| Cell temperature |
291 ± 2 K |
| Ambient diffraction temperature |
291 ± 2 K |
| Number of distinct elements |
3 |
| Space group number |
19 |
| Hermann-Mauguin space group symbol |
P 21 21 21 |
| Hall space group symbol |
P 2ac 2ab |
| Residual factor for all reflections |
0.122 |
| Residual factor for significantly intense reflections |
0.05 |
| Weighted residual factors for significantly intense reflections |
0.11 |
| Weighted residual factors for all reflections included in the refinement |
0.134 |
| Goodness-of-fit parameter for all reflections included in the refinement |
0.998 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
Yes |
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