Information card for entry 2220525
| Chemical name |
(3aR,8aR)-2,2,6,6-Tetramethyl-4,4,8,8-tetraphenyltetrahydro-1,3- dioxolo[4,5-<i>e</i>][1,3,2]dioxasilepine |
| Formula |
C33 H34 O4 Si |
| Calculated formula |
C33 H34 O4 Si |
| Title of publication |
(3a<i>R</i>,8a<i>R</i>)-2,2,6,6-Tetramethyl-4,4,8,8-tetraphenyltetrahydro-1,3-dioxolo[4,5-<i>e</i>][1,3,2]dioxasilepine |
| Authors of publication |
Hijji, Yousef M.; Hudrlik, Paul F.; Hudrlik, Anne M.; Butcher, Ray J.; Jasinski, Jerry P. |
| Journal of publication |
Acta Crystallographica Section E |
| Year of publication |
2009 |
| Journal volume |
65 |
| Journal issue |
1 |
| Pages of publication |
o135 |
| a |
10.008 ± 0.002 Å |
| b |
17.081 ± 0.003 Å |
| c |
17.271 ± 0.003 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
2952.4 ± 0.9 Å3 |
| Cell temperature |
293 ± 2 K |
| Ambient diffraction temperature |
293 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
19 |
| Hermann-Mauguin space group symbol |
P 21 21 21 |
| Hall space group symbol |
P 2ac 2ab |
| Residual factor for all reflections |
0.115 |
| Residual factor for significantly intense reflections |
0.0544 |
| Weighted residual factors for significantly intense reflections |
0.0965 |
| Weighted residual factors for all reflections included in the refinement |
0.1191 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.039 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
Yes |
| Has Fobs |
Yes |
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https://www.crystallography.net/2220525.html