Information card for entry 2232635
| Chemical name |
2,2'-(3,3'-Dihexyl-2,2'-bithiophene-5,5'-diyl)bis(4,4,5,5-tetramethyl- 1,3,2-dioxaborolane) |
| Formula |
C32 H52 B2 O4 S2 |
| Calculated formula |
C32 H52 B2 O4 S2 |
| SMILES |
B1(c2cc(c(c3c(cc(B4OC(C(C)(C)O4)(C)C)s3)CCCCCC)s2)CCCCCC)OC(C)(C)C(C)(C)O1 |
| Title of publication |
2,2'-(3,3'-Dihexyl-2,2'-bithiophene-5,5'-diyl)bis(4,4,5,5-tetramethyl-1,3,2-dioxaborolane) |
| Authors of publication |
Huang, Lin; Li, Huisheng |
| Journal of publication |
Acta Crystallographica Section E |
| Year of publication |
2011 |
| Journal volume |
67 |
| Journal issue |
12 |
| Pages of publication |
o3512 |
| a |
11.5004 ± 0.0011 Å |
| b |
13.6992 ± 0.0013 Å |
| c |
21.3 ± 0.002 Å |
| α |
90° |
| β |
91.065 ± 0.002° |
| γ |
90° |
| Cell volume |
3355.2 ± 0.6 Å3 |
| Cell temperature |
100 ± 2 K |
| Ambient diffraction temperature |
100 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/c 1 |
| Hall space group symbol |
-P 2ybc |
| Residual factor for all reflections |
0.0509 |
| Residual factor for significantly intense reflections |
0.039 |
| Weighted residual factors for significantly intense reflections |
0.112 |
| Weighted residual factors for all reflections included in the refinement |
0.1177 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.046 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
Yes |
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https://www.crystallography.net/2232635.html