Information card for entry 2242181
| Chemical name |
(4<i>S</i>,5<i>R</i>,6<i>S</i>)-4,5,6-Trihydroxy-3-methylcyclohex-2-enone |
| Formula |
C7 H10 O4 |
| Calculated formula |
C7 H10 O4 |
| SMILES |
C1(=O)C=C(C)[C@@H]([C@H]([C@@H]1O)O)O |
| Title of publication |
Crystal structure and absolute configuration of (4<i>S</i>,5<i>R</i>,6<i>S</i>)-4,5,6-trihydroxy-3-methylcyclohex-2-enone (gabosine H) |
| Authors of publication |
Tibhe, Gaurao D.; Macías, Mario A.; Pandolfi, Enrique; Schapiro, Valeria; Suescun, Leopoldo |
| Journal of publication |
Acta Crystallographica Section E |
| Year of publication |
2017 |
| Journal volume |
73 |
| Journal issue |
4 |
| Pages of publication |
606 - 609 |
| a |
5.4143 ± 0.0002 Å |
| b |
5.4176 ± 0.0002 Å |
| c |
11.92 ± 0.0005 Å |
| α |
90° |
| β |
90.977 ± 0.001° |
| γ |
90° |
| Cell volume |
349.59 ± 0.02 Å3 |
| Cell temperature |
298 ± 2 K |
| Ambient diffraction temperature |
298 ± 2 K |
| Number of distinct elements |
3 |
| Space group number |
4 |
| Hermann-Mauguin space group symbol |
P 1 21 1 |
| Hall space group symbol |
P 2yb |
| Residual factor for all reflections |
0.0333 |
| Residual factor for significantly intense reflections |
0.033 |
| Weighted residual factors for significantly intense reflections |
0.0874 |
| Weighted residual factors for all reflections included in the refinement |
0.0877 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.079 |
| Diffraction radiation wavelength |
1.54178 Å |
| Diffraction radiation type |
CuKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
Yes |
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https://www.crystallography.net/2242181.html