Information card for entry 2242573
| Chemical name |
2-Bromo-1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)trisilane |
| Formula |
C9 H27 Br Si4 |
| Calculated formula |
C9 H27 Br Si4 |
| SMILES |
Br[Si]([Si](C)(C)C)([Si](C)(C)C)[Si](C)(C)C |
| Title of publication |
Crystal structures of 2-bromo-1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)trisilane and 2-bromo-1,1,1,3,3,3-hexaisopropyl-2-(triisopropylsilyl)trisilane |
| Authors of publication |
Gulotty, Eva M.; Staples, Richard J.; Biros, Shannon M.; Gaspar, Peter P.; Rath, Nigam P.; Winchester, William R. |
| Journal of publication |
Acta Crystallographica Section E |
| Year of publication |
2018 |
| Journal volume |
74 |
| Journal issue |
8 |
| Pages of publication |
1142 - 1146 |
| a |
15.6497 ± 0.0019 Å |
| b |
15.6497 ± 0.0019 Å |
| c |
15.6497 ± 0.0019 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
3832.8 ± 0.8 Å3 |
| Cell temperature |
173 ± 2 K |
| Ambient diffraction temperature |
173.15 K |
| Number of distinct elements |
4 |
| Space group number |
205 |
| Hermann-Mauguin space group symbol |
P a -3 |
| Hall space group symbol |
-P 2ac 2ab 3 |
| Residual factor for all reflections |
0.0405 |
| Residual factor for significantly intense reflections |
0.0284 |
| Weighted residual factors for significantly intense reflections |
0.0683 |
| Weighted residual factors for all reflections included in the refinement |
0.0748 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.05 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
Yes |
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https://www.crystallography.net/2242573.html