Information card for entry 4003889
| Formula |
C54 H65 N5 O2 S5 |
| Calculated formula |
C54 H65 N5 O2 S5 |
| Title of publication |
Radically Tunable n-Type Organic Semiconductor via Polymorph Control |
| Authors of publication |
Davies, Daniel William; Park, Sang Kyu; Kafle, Prapti; Chung, Hyunjoong; Yuan, Dafei; Strzalka, Joseph W.; Mannsfeld, Stefan C. B.; Wang, SuYin Grass; Chen, Yu-Sheng; Gray, Danielle L.; Zhu, Xiaozhang; Diao, Ying |
| Journal of publication |
Chemistry of Materials |
| Year of publication |
2021 |
| a |
50.528 ± 0.007 Å |
| b |
10.1868 ± 0.0012 Å |
| c |
24.059 ± 0.003 Å |
| α |
90° |
| β |
113.034 ± 0.002° |
| γ |
90° |
| Cell volume |
11396 ± 3 Å3 |
| Cell temperature |
273 ± 2 K |
| Ambient diffraction temperature |
273 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
15 |
| Hermann-Mauguin space group symbol |
C 1 2/c 1 |
| Hall space group symbol |
-C 2yc |
| Residual factor for all reflections |
0.0848 |
| Residual factor for significantly intense reflections |
0.0766 |
| Weighted residual factors for significantly intense reflections |
0.2374 |
| Weighted residual factors for all reflections included in the refinement |
0.2507 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.046 |
| Diffraction radiation wavelength |
0.41328 Å |
| Diffraction radiation type |
synchrotron |
| Has coordinates |
Yes |
| Has disorder |
Yes |
| Has Fobs |
No |
For the version history of this entry, please navigate to main COD server.
The link is:
https://www.crystallography.net/4003889.html