Information card for entry 4022331
| Chemical name |
(3aR,4R,5S,6R,6aS)-5,6-bis(trimethylsilyloxy)-3a,5,6,6a-tetrahydrospiro [cyclopenta[b]furo-4(5H),2'(5'H)-furan]-2(3H),5'-dione |
| Formula |
C16 H26 O6 Si2 |
| Calculated formula |
C16 H26 O6 Si2 |
| SMILES |
[C@@H]12CC(=O)O[C@@H]1[C@H]([C@@H]([C@@]12OC(=O)C=C1)O[Si](C)(C)C)O[Si](C)(C)C |
| Title of publication |
C2-Symmetric Enantiopure Ethanotethered Bis(α,β-butenolides) as Templates for Asymmetric Synthesis. Application to the Synthesis of (+)-Grandisol |
| Authors of publication |
Pedro de March; Marta Figueredo; Josep Font; Javier Raya; Ángel Álvarez-Larena; Juan F. Piniella |
| Journal of publication |
Journal of Organic Chemistry |
| Year of publication |
2003 |
| Journal volume |
68 |
| Pages of publication |
2437 - 2447 |
| a |
7.483 ± 0.002 Å |
| b |
11.221 ± 0.003 Å |
| c |
25.339 ± 0.005 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
2127.6 ± 0.9 Å3 |
| Cell temperature |
293 ± 2 K |
| Ambient diffraction temperature |
293 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
19 |
| Hermann-Mauguin space group symbol |
P 21 21 21 |
| Hall space group symbol |
P 2ac 2ab |
| Residual factor for all reflections |
0.12 |
| Residual factor for significantly intense reflections |
0.1037 |
| Weighted residual factors for significantly intense reflections |
0.2433 |
| Weighted residual factors for all reflections included in the refinement |
0.2496 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.131 |
| Method of determination |
single crystal |
| Diffraction radiation wavelength |
0.71069 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/4022331.html