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Information card for entry 4022399
Preview
| Coordinates | 4022399.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C22 H21 F3 N2 O6 |
|---|---|
| Calculated formula | C22 H21 F3 N2 O6 |
| SMILES | [N+]1(c2ccccc2C(C)(C)C=1/C=C/c1c(O)ccc(c1)N(=O)=O)CCO.C(=O)([O-])C(F)(F)F |
| Title of publication | Digital Processing with a Three-State Molecular Switch |
| Authors of publication | Françisco M. Raymo; Silvia Giordani; Andrew J. P. White; David J. Williams |
| Journal of publication | Journal of Organic Chemistry |
| Year of publication | 2003 |
| Journal volume | 68 |
| Pages of publication | 4158 - 4169 |
| a | 8.7775 ± 0.0007 Å |
| b | 11.4944 ± 0.0015 Å |
| c | 11.6367 ± 0.0012 Å |
| α | 77.587 ± 0.009° |
| β | 71.224 ± 0.007° |
| γ | 82.623 ± 0.009° |
| Cell volume | 1083.4 ± 0.2 Å3 |
| Cell temperature | 293 ± 2 K |
| Ambient diffraction temperature | 293 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0658 |
| Residual factor for significantly intense reflections | 0.0479 |
| Weighted residual factors for all reflections | 0.1357 |
| Weighted residual factors for significantly intense reflections | 0.1204 |
| Goodness-of-fit parameter for all reflections | 1.061 |
| Goodness-of-fit parameter for significantly intense reflections | 1.111 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4022399.html
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Users of the data should acknowledge the original authors of the
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