Information card for entry 4030764
| Formula |
C20 H12 F12 O2 Si |
| Calculated formula |
C20 H12 F12 O2 Si |
| SMILES |
[Si]12(OC(c3c1ccc(c3)C)(C(F)(F)F)C(F)(F)F)OC(c1c2ccc(c1)C)(C(F)(F)F)C(F)(F)F |
| Title of publication |
Versatile Access to Martin's Spirosilanes and Their Hypervalent Derivatives. |
| Authors of publication |
Lenormand, Hugo; Corcé, Vincent; Sorin, Geoffroy; Chhun, Christine; Chamoreau, Lise-Marie; Krim, Lahouari; Zins, Emilie-Laure; Goddard, Jean-Philippe; Fensterbank, Louis |
| Journal of publication |
The Journal of organic chemistry |
| Year of publication |
2015 |
| Journal volume |
80 |
| Journal issue |
6 |
| Pages of publication |
3280 - 3288 |
| a |
9.3373 ± 0.0002 Å |
| b |
20.6773 ± 0.0004 Å |
| c |
12.0406 ± 0.0003 Å |
| α |
90° |
| β |
109.931 ± 0.001° |
| γ |
90° |
| Cell volume |
2185.44 ± 0.08 Å3 |
| Cell temperature |
200 ± 2 K |
| Ambient diffraction temperature |
200 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/n 1 |
| Hall space group symbol |
-P 2yn |
| Residual factor for all reflections |
0.0347 |
| Residual factor for significantly intense reflections |
0.0325 |
| Weighted residual factors for significantly intense reflections |
0.0894 |
| Weighted residual factors for all reflections included in the refinement |
0.0918 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.024 |
| Diffraction radiation wavelength |
1.54178 Å |
| Diffraction radiation type |
CuKα |
| Has coordinates |
Yes |
| Has disorder |
Yes |
| Has Fobs |
No |
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