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Information card for entry 4035009
Preview
| Coordinates | 4035009.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C47 H52 Co2 O4 P2 Si2 |
|---|---|
| Calculated formula | C47 H52 Co2 O4 P2 Si2 |
| SMILES | C(#[O])[Co]123(C#[O])[C]4(C#C[Si](C)(C)C)=[C]1(C#C[Si](C(C)C)(C(C)C)C(C)C)[Co]24(C#[O])(C#[O])[P](c1ccccc1)(c1ccccc1)C[P]3(c1ccccc1)c1ccccc1 |
| Title of publication | Synthesis of Polyynes Using Dicobalt Masking Groups. |
| Authors of publication | Kohn, Daniel R.; Gawel, Przemyslaw; Xiong, Yaoyao; Christensen, Kirsten E.; Anderson, Harry L. |
| Journal of publication | The Journal of organic chemistry |
| Year of publication | 2018 |
| Journal volume | 83 |
| Journal issue | 4 |
| Pages of publication | 2077 - 2086 |
| a | 14.1381 ± 0.0001 Å |
| b | 15.8779 ± 0.0001 Å |
| c | 20.5634 ± 0.0002 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 4616.14 ± 0.06 Å3 |
| Cell temperature | 150 K |
| Ambient diffraction temperature | 150 K |
| Number of distinct elements | 6 |
| Space group number | 19 |
| Hermann-Mauguin space group symbol | P 21 21 21 |
| Hall space group symbol | P 2ac 2ab |
| Residual factor for all reflections | 0.0371 |
| Residual factor for significantly intense reflections | 0.0296 |
| Weighted residual factors for all reflections | 0.0683 |
| Weighted residual factors for significantly intense reflections | 0.0641 |
| Weighted residual factors for all reflections included in the refinement | 0.0683 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.006 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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Users of the data should acknowledge the original authors of the
structural data.