Information card for entry 4064029

Structure parameters

• Common name: COMPOUND 3b
• Formula: C78 H75 Cl Ge4
• Calculated formula: C78 H75 Cl Ge4
• SMILES: c1(ccccc1)[Ge](c1ccccc1)(c1ccccc1)[Ge](Cl)([Ge](c1ccccc1)(c1ccccc1)c1ccccc1)[Ge](c1ccccc1)(c1ccccc1)c1ccccc1.c1ccccc1.C1CCCCC1.c1ccccc1.c1ccccc1
• Title of publication: Syntheses, Structures, and Electronic Properties of the Branched Oligogermanes (Ph3Ge)3GeH and (Ph3Ge)3GeX (X = Cl, Br, I)†
• Authors of publication: Samanamu, Christian R.; Amadoruge, Monika L.; Yoder, Claude H.; Golen, James A.; Moore, Curtis E.; Rheingold, Arnold L.; Materer, Nicholas F.; Weinert, Charles S.
• Journal of publication: Organometallics
• Year of publication: 2011
• Journal volume: 30
• Journal issue: 5
• Pages of publication: 1046
• a: 18.6792 ± 0.0014 Å
• b: 18.6792 ± 0.0014 Å
• c: 9.874 ± 0.0007 Å
• α: 90°
• β: 90°
• γ: 120°
• Cell volume: 2983.6 ± 0.4 ų
• Cell temperature: 100 ± 2 K
• Ambient diffraction temperature: 100 ± 2 K
• Number of distinct elements: 4
• Space group number: 173
• Hermann-Mauguin space group symbol: P 63
• Hall space group symbol: P 6c
• Residual factor for all reflections: 0.0671
• Residual factor for significantly intense reflections: 0.0487
• Weighted residual factors for significantly intense reflections: 0.1061
• Weighted residual factors for all reflections included in the refinement: 0.1173
• Goodness-of-fit parameter for all reflections included in the refinement: 1.047
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No