Information card for entry 4064488

Structure parameters

• Formula: C30 H46 Co2 Si4
• Calculated formula: C30 H46 Co2 Si4
• SMILES: [Co]123456789[c]%10([cH]1[c]2([c]13[CH]2=[CH]3[CH]%11=[CH]([c]8%101)[Co]18%10%12923%11[c]2([cH]1[c]8([c]1%10[CH]4=[CH]5[CH]6=[CH]7[c]%1221)[Si](C)(C)C)[Si](C)(C)C)[Si](C)(C)C)[Si](C)(C)C
• Title of publication: Indenyl Ligands as Supports for Reactive, Low-Valent Cobalt(I) Fragments
• Authors of publication: Hung-Low, Fernando; Bradley, Christopher A.
• Journal of publication: Organometallics
• Year of publication: 2011
• Journal volume: 30
• Journal issue: 10
• Pages of publication: 2636
• a: 7.2804 ± 0.0002 Å
• b: 10.4812 ± 0.0003 Å
• c: 10.8965 ± 0.0003 Å
• α: 91.494 ± 0.002°
• β: 101.59 ± 0.002°
• γ: 102.986 ± 0.002°
• Cell volume: 791.49 ± 0.04 ų
• Cell temperature: 150 ± 2 K
• Ambient diffraction temperature: 150 ± 2 K
• Number of distinct elements: 4
• Space group number: 2
• Hermann-Mauguin space group symbol: P -1
• Hall space group symbol: -P 1
• Residual factor for all reflections: 0.0319
• Residual factor for significantly intense reflections: 0.0253
• Weighted residual factors for significantly intense reflections: 0.0611
• Weighted residual factors for all reflections included in the refinement: 0.0647
• Goodness-of-fit parameter for all reflections included in the refinement: 1.035
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No