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Information card for entry 4064747
Preview
| Coordinates | 4064747.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C50 H59 Cl0 N2 O P Si |
|---|---|
| Calculated formula | C50 H59 N2 O P Si |
| SMILES | CC1=CC(=C)N(c2c(cccc2C(C)C)C(C)C)[SiH](C(C(=O)C)=P(c2ccccc2)(c2ccccc2)c2ccccc2)N1c1c(cccc1C(C)C)C(C)C |
| Title of publication | Regiospecific C‒H Bond Activation: Reactivity Study of N-Heterocyclic Silylene toward Ambidentate Phosphorus Ylide |
| Authors of publication | Azhakar, Ramachandran; Sarish, Sankaranarayana Pillai; Roesky, Herbert W.; Hey, Jakob; Stalke, Dietmar |
| Journal of publication | Organometallics |
| Year of publication | 2011 |
| Journal volume | 30 |
| Journal issue | 11 |
| Pages of publication | 2897 |
| a | 24.976 ± 0.006 Å |
| b | 11.607 ± 0.003 Å |
| c | 35.602 ± 0.009 Å |
| α | 90° |
| β | 98.43 ± 0.003° |
| γ | 90° |
| Cell volume | 10209 ± 4 Å3 |
| Cell temperature | 110 ± 2 K |
| Ambient diffraction temperature | 110 ± 2 K |
| Number of distinct elements | 7 |
| Space group number | 15 |
| Hermann-Mauguin space group symbol | C 1 2/c 1 |
| Hall space group symbol | -C 2yc |
| Residual factor for all reflections | 0.0699 |
| Residual factor for significantly intense reflections | 0.0497 |
| Weighted residual factors for significantly intense reflections | 0.1153 |
| Weighted residual factors for all reflections included in the refinement | 0.1222 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.038 |
| Diffraction radiation wavelength | 0.56086 Å |
| Diffraction radiation type | AgKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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structural data.