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Information card for entry 4065144
Preview
| Coordinates | 4065144.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C24 H43 B2 F4 N6 Os P |
|---|---|
| Calculated formula | C24 H43 B2 F4 N6 Os P |
| SMILES | [Os]1234([n]5n(ccc5)[BH](n5[n]1ccc5)n1[n]2ccc1)([CH2]=[CH2]3)([CH2]=[CH2]4)CC[P+](C(C)C)(C(C)C)C(C)C.[B](F)(F)(F)[F-] |
| Title of publication | Reactions of an Osmium Bis(dihydrogen) Complex under Ethylene: Phosphine Addition to a C‒C Double Bond and C‒H Bond Activation of Fluoroarenes |
| Authors of publication | Bajo, Sonia; Esteruelas, Miguel A.; López, Ana M.; Oñate, Enrique |
| Journal of publication | Organometallics |
| Year of publication | 2011 |
| Journal volume | 30 |
| Journal issue | 21 |
| Pages of publication | 5710 |
| a | 18.9405 ± 0.0011 Å |
| b | 8.6971 ± 0.0005 Å |
| c | 17.7071 ± 0.0011 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 2916.8 ± 0.3 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100 ± 2 K |
| Number of distinct elements | 7 |
| Space group number | 29 |
| Hermann-Mauguin space group symbol | P c a 21 |
| Hall space group symbol | P 2c -2ac |
| Residual factor for all reflections | 0.0574 |
| Residual factor for significantly intense reflections | 0.0449 |
| Weighted residual factors for significantly intense reflections | 0.1071 |
| Weighted residual factors for all reflections included in the refinement | 0.1139 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.161 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4065144.html
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