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Information card for entry 4069183
Preview
| Coordinates | 4069183.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Common name | amidochloroHalfnium |
|---|---|
| Chemical name | Halfnium Trimethyl silyl amido dimethyl amido chloride |
| Formula | C20 H60 Cl2 Hf2 N6 Si4 |
| Calculated formula | C20 H60 Cl2 Hf2 N6 Si4 |
| SMILES | CN(C)[Hf]1([Cl][Hf](N([Si](C)(C)C)[Si](C)(C)C)(N(C)C)(N(C)C)[Cl]1)(N([Si](C)(C)C)[Si](C)(C)C)N(C)C |
| Title of publication | Synthesis and Characterization of Group 4 Amide Chloride and Amide Imide Complexes |
| Authors of publication | Yu, Xianghua; Chen, Shu-Jian; Wang, Xiaoping; Chen, Xue-Tai; Xue, Zi-Ling |
| Journal of publication | Organometallics |
| Year of publication | 2009 |
| Journal volume | 28 |
| Journal issue | 15 |
| Pages of publication | 4269 |
| a | 24.897 ± 0.019 Å |
| b | 10.341 ± 0.008 Å |
| c | 15.201 ± 0.012 Å |
| α | 90° |
| β | 104.09 ± 0.012° |
| γ | 90° |
| Cell volume | 3796 ± 5 Å3 |
| Cell temperature | 173 ± 2 K |
| Ambient diffraction temperature | 173 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 15 |
| Hermann-Mauguin space group symbol | C 1 2/c 1 |
| Hall space group symbol | -C 2yc |
| Residual factor for all reflections | 0.0269 |
| Residual factor for significantly intense reflections | 0.0231 |
| Weighted residual factors for significantly intense reflections | 0.0672 |
| Weighted residual factors for all reflections included in the refinement | 0.0707 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.813 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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