Information card for entry 4069409
| Formula |
C14 H39 Ge I Si4 |
| Calculated formula |
C14 H39 Ge I Si4 |
| SMILES |
[GeH](I)(C([Si](C)(C)C)[Si](C)(C)C)C([Si](C)(C)C)[Si](C)(C)C |
| Title of publication |
Silylene- and Germylene-Mediated C−H Activation: Reaction with Alkanes, Ethers, and Amines |
| Authors of publication |
Walker, Randon H.; Miller, Karla A.; Scott, Sara L.; Cygan, Zuzanna T.; Bartolin, Jeffrey M.; Kampf, Jeff W.; Banaszak Holl, Mark M. |
| Journal of publication |
Organometallics |
| Year of publication |
2009 |
| Journal volume |
28 |
| Journal issue |
9 |
| Pages of publication |
2744 |
| a |
9.2067 ± 0.001 Å |
| b |
21.527 ± 0.002 Å |
| c |
13.1974 ± 0.0014 Å |
| α |
90° |
| β |
110.055 ± 0.002° |
| γ |
90° |
| Cell volume |
2457 ± 0.4 Å3 |
| Cell temperature |
150 ± 2 K |
| Ambient diffraction temperature |
150 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
9 |
| Hermann-Mauguin space group symbol |
C 1 c 1 |
| Hall space group symbol |
C -2yc |
| Residual factor for all reflections |
0.0192 |
| Residual factor for significantly intense reflections |
0.0189 |
| Weighted residual factors for significantly intense reflections |
0.0502 |
| Weighted residual factors for all reflections included in the refinement |
0.0504 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.032 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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