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Information card for entry 4070123
Preview
| Coordinates | 4070123.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C25 H42 Si2 U |
|---|---|
| Calculated formula | C25 H42 Si2 U |
| SMILES | [U]123456789%10%11([c]%12([c]1([c]2(C)[c]8([c]7%12C)C)C)C)([CH]1=[CH]9[CH]%10=[CH]%11[CH]6=[CH]5[CH]4=[CH]31)C([Si](C)(C)C)[Si](C)(C)C |
| Title of publication | Synthesis and Insertion Chemistry of Monoalkyl and Monoaryl Uranium(IV) Heteroleptic Metallocene Complexes |
| Authors of publication | Evans, William J.; Takase, Michael K.; Ziller, Joseph W.; Rheingold, Arnold L. |
| Journal of publication | Organometallics |
| Year of publication | 2009 |
| Journal volume | 28 |
| Journal issue | 19 |
| Pages of publication | 5802 |
| a | 18.6588 ± 0.0018 Å |
| b | 14.663 ± 0.0014 Å |
| c | 9.254 ± 0.0009 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 2531.8 ± 0.4 Å3 |
| Cell temperature | 153 ± 2 K |
| Ambient diffraction temperature | 153 ± 2 K |
| Number of distinct elements | 4 |
| Space group number | 62 |
| Hermann-Mauguin space group symbol | P n m a |
| Hall space group symbol | -P 2ac 2n |
| Residual factor for all reflections | 0.0175 |
| Residual factor for significantly intense reflections | 0.0143 |
| Weighted residual factors for significantly intense reflections | 0.0338 |
| Weighted residual factors for all reflections included in the refinement | 0.0352 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.095 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4070123.html
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Users of the data should acknowledge the original authors of the
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