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Information card for entry 4072661
Preview
| Coordinates | 4072661.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C30 H60 N4 O3 Os2 Pd Si4 |
|---|---|
| Calculated formula | C30 H60 N4 O3 Os2 Pd Si4 |
| SMILES | C([Os]12(C[Si](C)(C)C)(#N)[O]3[Os]4(C[Si](C)(C)C)(C[Si](C)(C)C)(#N)[O]1[Pd]1234[n]2ccccc2c2cccc[n]12)[Si](C)(C)C.O1CCCC1 |
| Title of publication | Synthesis, Structure, and Reactivity of Organometallic Osmium(VI) Hydroxo Compounds |
| Authors of publication | Kiefer, Adam M.; Giles, John A.; Shapley, Patricia A. |
| Journal of publication | Organometallics |
| Year of publication | 2007 |
| Journal volume | 26 |
| Journal issue | 8 |
| Pages of publication | 1881 |
| a | 12.35 ± 0.0009 Å |
| b | 18.3598 ± 0.0013 Å |
| c | 19.9189 ± 0.0013 Å |
| α | 90° |
| β | 101.883 ± 0.003° |
| γ | 90° |
| Cell volume | 4419.7 ± 0.5 Å3 |
| Cell temperature | 297 ± 2 K |
| Ambient diffraction temperature | 297 ± 2 K |
| Number of distinct elements | 7 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for all reflections | 0.0624 |
| Residual factor for significantly intense reflections | 0.0327 |
| Weighted residual factors for significantly intense reflections | 0.0641 |
| Weighted residual factors for all reflections included in the refinement | 0.0769 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.02 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
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