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Information card for entry 4074270
Preview
| Coordinates | 4074270.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C17 H36 P Rh Si |
|---|---|
| Calculated formula | C17 H36 P Rh Si |
| SMILES | [cH]12[cH]3[cH]4[cH]5[cH]1[RhH]2345([P](C)(C)C)[Si](C(C)C)(C(C)C)C(C)C |
| Title of publication | Comparisons of Photoinduced Oxidative Addition of B−H, B−B, and Si−H Bonds at Rhodium(η5-cyclopentadienyl)phosphine Centers |
| Authors of publication | Câmpian, Marius V.; Harris, Jeremy L.; Jasim, Naser; Perutz, Robin N.; Marder, Todd B.; Whitwood, Adrian C. |
| Journal of publication | Organometallics |
| Year of publication | 2006 |
| Journal volume | 25 |
| Journal issue | 21 |
| Pages of publication | 5093 |
| a | 8.6515 ± 0.0004 Å |
| b | 10.4606 ± 0.0005 Å |
| c | 12.1019 ± 0.0006 Å |
| α | 74.981 ± 0.001° |
| β | 71.512 ± 0.001° |
| γ | 72.05 ± 0.001° |
| Cell volume | 972.2 ± 0.08 Å3 |
| Cell temperature | 110 ± 2 K |
| Ambient diffraction temperature | 110 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0166 |
| Residual factor for significantly intense reflections | 0.0158 |
| Weighted residual factors for significantly intense reflections | 0.0407 |
| Weighted residual factors for all reflections included in the refinement | 0.0409 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.049 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4074270.html
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Users of the data should acknowledge the original authors of the
structural data.