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Information card for entry 4075270
Preview
| Coordinates | 4075270.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C30 H49 F3 N2 O3 P2 S Si Ti |
|---|---|
| Calculated formula | C30 H49 F3 N2 O3 P2 S Si Ti |
| SMILES | [Ti]12([P](c3cc(C)ccc3N1c1ccc(C)cc1[P]2(C(C)C)C(C)C)(C(C)C)C(C)C)(=N[Si](C)(C)C)OS(=O)(=O)C(F)(F)F |
| Title of publication | Terminal Titanium(IV) (Trimethylsilyl)imides Prepared by Oxidatively Induced Trimethylsilyl Abstraction |
| Authors of publication | Bailey, Brad C.; Basuli, Falguni; Huffman, John C.; Mindiola, Daniel J. |
| Journal of publication | Organometallics |
| Year of publication | 2006 |
| Journal volume | 25 |
| Journal issue | 11 |
| Pages of publication | 2725 |
| a | 12.1919 ± 0.0007 Å |
| b | 15.1607 ± 0.0009 Å |
| c | 21.3558 ± 0.0013 Å |
| α | 90° |
| β | 106.39 ± 0.002° |
| γ | 90° |
| Cell volume | 3786.9 ± 0.4 Å3 |
| Cell temperature | 125 ± 2 K |
| Ambient diffraction temperature | 125 ± 2 K |
| Number of distinct elements | 9 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.06 |
| Residual factor for significantly intense reflections | 0.034 |
| Weighted residual factors for significantly intense reflections | 0.0678 |
| Weighted residual factors for all reflections included in the refinement | 0.0748 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.88 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4075270.html
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