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Information card for entry 4076879
Preview
| Coordinates | 4076879.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C33 H64 Li N4 O Si2 Ta |
|---|---|
| Calculated formula | C33 H60 Li N4 O Si2 Ta |
| SMILES | [Ta]12([O](=[C]2=C[Si](C)(C)C)[Li]23[N]41CC[N]2(CC[N]3(CC4)C(C)C)C(C)C)(=Nc1c(cccc1C(C)C)C(C)C)C[Si](C)(C)C |
| Title of publication | Reactions of a Triazacyclononane-Supported Tantalum−Lithium Bridging Alkylidene with Organic Substrates |
| Authors of publication | Schmidt, Joseph A. R.; Arnold, John |
| Journal of publication | Organometallics |
| Year of publication | 2002 |
| Journal volume | 21 |
| Journal issue | 16 |
| Pages of publication | 3426 |
| a | 17.1859 ± 0.0003 Å |
| b | 19.2859 ± 0.0003 Å |
| c | 24.3778 ± 0.0004 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 8079.9 ± 0.2 Å3 |
| Cell temperature | 166.2 K |
| Ambient diffraction temperature | 166.2 K |
| Number of distinct elements | 7 |
| Space group number | 61 |
| Hermann-Mauguin space group symbol | P b c a |
| Hall space group symbol | -P 2ac 2ab |
| Residual factor for all reflections | 0.0596 |
| Residual factor for significantly intense reflections | 0.025 |
| Weighted residual factors for all reflections | 0.0366 |
| Weighted residual factors for significantly intense reflections | 0.0283 |
| Weighted residual factors for all reflections included in the refinement | 0.0283 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.79 |
| Diffraction radiation wavelength | 0.7107 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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