Information card for entry 4078244

Structure parameters

• Formula: C42 H64 Ni2 P2 Si2
• Calculated formula: C42 H64 Ni2 P2 Si2
• SMILES: [P](C(C)C)(C(C)C)(C(C)C)[Ni]123[H][Si]2(c2ccccc2)(c2ccccc2)[Ni]21([H][Si]32(c1ccccc1)c1ccccc1)[P](C(C)C)(C(C)C)C(C)C
• Title of publication: Structural Similarities in Dinuclear, Tetranuclear, and Pentanuclear Nickel Silyl and Silylene Complexes Obtained via Si‒H and Si‒C Activation
• Authors of publication: Beck, Robert; Johnson, Samuel A.
• Journal of publication: Organometallics
• Year of publication: 2012
• Journal volume: 31
• Journal issue: 9
• Pages of publication: 3599
• a: 11.713 ± 0.002 Å
• b: 17.723 ± 0.004 Å
• c: 10.674 ± 0.002 Å
• α: 90°
• β: 108.04 ± 0.03°
• γ: 90°
• Cell volume: 2106.9 ± 0.8 ų
• Cell temperature: 173 ± 2 K
• Ambient diffraction temperature: 173 ± 2 K
• Number of distinct elements: 5
• Space group number: 14
• Hermann-Mauguin space group symbol: P 1 21/c 1
• Hall space group symbol: -P 2ybc
• Residual factor for all reflections: 0.033
• Residual factor for significantly intense reflections: 0.0295
• Weighted residual factors for significantly intense reflections: 0.0738
• Weighted residual factors for all reflections included in the refinement: 0.077
• Goodness-of-fit parameter for all reflections included in the refinement: 1.05
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No