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Information card for entry 4079905
Preview
| Coordinates | 4079905.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C44 H49 Bi N2 Se |
|---|---|
| Calculated formula | C44 H49 Bi N2 Se |
| SMILES | [Bi]([Se]c1ccccc1)(c1ccccc1/C=N/c1c(C(C)C)cccc1C(C)C)c1c(/C=N/c2c(C(C)C)cccc2C(C)C)cccc1 |
| Title of publication | Oxidative Addition of Diphenyldichalcogenides PhEEPh (E = S, Se, Te) to Low-Valent CN- and NCN-Chelated Organoantimony and Organobismuth Compounds |
| Authors of publication | Šimon, Petr; Jambor, Roman; Růžička, Aleš; Dostál, Libor |
| Journal of publication | Organometallics |
| Year of publication | 2013 |
| Journal volume | 32 |
| Journal issue | 1 |
| Pages of publication | 239 |
| a | 11.467 ± 0.0009 Å |
| b | 12.9619 ± 0.0013 Å |
| c | 13.9831 ± 0.0016 Å |
| α | 111.97 ± 0.007° |
| β | 96.572 ± 0.008° |
| γ | 93.387 ± 0.008° |
| Cell volume | 1903 ± 0.3 Å3 |
| Cell temperature | 150 ± 1 K |
| Ambient diffraction temperature | 150 ± 1 K |
| Number of distinct elements | 5 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0564 |
| Residual factor for significantly intense reflections | 0.0414 |
| Weighted residual factors for significantly intense reflections | 0.0944 |
| Weighted residual factors for all reflections included in the refinement | 0.1053 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.116 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4079905.html
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Users of the data should acknowledge the original authors of the
structural data.