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Information card for entry 4082567
Preview
| Coordinates | 4082567.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C26 H48 Cu F3 N4 O4 S Si |
|---|---|
| Calculated formula | C26 H48 Cu F3 N4 O4 S Si |
| SMILES | [Cu]1([N](C)(C)CC[N]1(C)C)=[Si]1([N](C(C)(C)C)=C(c2ccccc2)(N1C(C)(C)C))OC(C)(C)C.C(F)(F)(F)S(=O)(=O)[O-] |
| Title of publication | Facile Access to Mono- and Dinuclear Heteroleptic N-Heterocyclic Silylene Copper Complexes |
| Authors of publication | Tan, Gengwen; Blom, Burgert; Gallego, Daniel; Driess, Matthias |
| Journal of publication | Organometallics |
| Year of publication | 2014 |
| Journal volume | 33 |
| Journal issue | 1 |
| Pages of publication | 363 |
| a | 11.3849 ± 0.0005 Å |
| b | 11.8599 ± 0.0004 Å |
| c | 12.8308 ± 0.0004 Å |
| α | 90.57 ± 0.003° |
| β | 96.796 ± 0.003° |
| γ | 95.478 ± 0.003° |
| Cell volume | 1712.04 ± 0.11 Å3 |
| Cell temperature | 150 ± 2 K |
| Ambient diffraction temperature | 150 ± 2 K |
| Number of distinct elements | 8 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0406 |
| Residual factor for significantly intense reflections | 0.0323 |
| Weighted residual factors for significantly intense reflections | 0.0787 |
| Weighted residual factors for all reflections included in the refinement | 0.0819 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.03 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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