Information card for entry 4087129
| Formula |
C36 H42 Si4 |
| Calculated formula |
C36 H42 Si4 |
| SMILES |
c1(cc(c2ccc3c(cc(c4ccc1c2c34)C#C[Si](C)(C)C)C#C[Si](C)(C)C)C#C[Si](C)(C)C)C#C[Si](C)(C)C |
| Title of publication |
Trimethylsilyl Group Assisted Stimuli Response: Self-Assembly of 1,3,6,8-Tetrakis((trimethysilyl)ethynyl)pyrene |
| Authors of publication |
Xu, Feng; Nishida, Takanori; Shinohara, Kenta; Peng, Lifen; Takezaki, Makoto; Kamada, Takahiro; Akashi, Haruo; Nakamura, Hiromu; Sugiyama, Kouki; Ohta, Kazuchika; Orita, Akihiro; Otera, Junzo |
| Journal of publication |
Organometallics |
| Year of publication |
2017 |
| Journal volume |
36 |
| Journal issue |
3 |
| Pages of publication |
556 |
| a |
6.316 ± 0.0018 Å |
| b |
10.023 ± 0.003 Å |
| c |
15.378 ± 0.005 Å |
| α |
70.431 ± 0.009° |
| β |
81.29 ± 0.012° |
| γ |
80.513 ± 0.013° |
| Cell volume |
899.9 ± 0.5 Å3 |
| Cell temperature |
93 K |
| Ambient diffraction temperature |
93 K |
| Number of distinct elements |
3 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for significantly intense reflections |
0.0545 |
| Weighted residual factors for all reflections included in the refinement |
0.1218 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.098 |
| Diffraction radiation wavelength |
0.71075 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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