Information card for entry 4087563

Structure parameters

• Formula: C28 H64 K O6 P Si4
• Calculated formula: C28 H64 K O6 P Si4
• SMILES: [P-]1C(CCC1([Si](C)(C)C)[Si](C)(C)C)([Si](C)(C)C)[Si](C)(C)C.[K]12345[O]6CC[O]1CC[O]3CC[O]4CC[O]5CC[O]2CC6
• Title of publication: Redox Reactions of a Stable Dialkylphosphinyl Radical
• Authors of publication: Hirakawa, Fumiya; Ichikawa, Hitomi; Ishida, Shintaro; Iwamoto, Takeaki
• Journal of publication: Organometallics
• Year of publication: 2015
• Journal volume: 34
• Journal issue: 12
• Pages of publication: 2714
• a: 9.908 ± 0.003 Å
• b: 10.852 ± 0.003 Å
• c: 18.585 ± 0.005 Å
• α: 94.352 ± 0.003°
• β: 92.112 ± 0.004°
• γ: 101.411 ± 0.004°
• Cell volume: 1950.4 ± 1 ų
• Cell temperature: 100 ± 2 K
• Ambient diffraction temperature: 100 ± 2 K
• Number of distinct elements: 6
• Space group number: 2
• Hermann-Mauguin space group symbol: P -1
• Hall space group symbol: -P 1
• Residual factor for all reflections: 0.0661
• Residual factor for significantly intense reflections: 0.048
• Weighted residual factors for significantly intense reflections: 0.1152
• Weighted residual factors for all reflections included in the refinement: 0.1292
• Goodness-of-fit parameter for all reflections included in the refinement: 1.044
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No