Information card for entry 4089448

Structure parameters

• Formula: C26 H44 O6 Si3
• Calculated formula: C26 H44 O6 Si3
• SMILES: c1(c(OC)cc(OC)cc1OC)[Si](C)(C)C[Si](C)(C)C[Si](C)(C)c1c(OC)cc(OC)cc1OC
• Title of publication: Synthesis of Silicon-Functionalized (Silylmethyl)silanes and α,ω-Dichlorocarbosilanes Using the TMOP (2,4,6-Trimethoxyphenyl) Protecting Group: (TMOP)Me2SiCH2Cl and (TMOP)2MeSiCH2Cl as Reagents To Introduce the ClMe2SiCH2, MeOMe2SiCH2, or Cl2MeSiCH2 Group by Nucleophilic Substitution at Silicon
• Authors of publication: Laskowski, Nadine; Reis, Eva-Maria; Kötzner, Lisa; Baus, Johannes A.; Burschka, Christian; Tacke, Reinhold
• Journal of publication: Organometallics
• Year of publication: 2013
• Journal volume: 32
• Journal issue: 11
• Pages of publication: 3269
• a: 11.164 ± 0.002 Å
• b: 11.693 ± 0.002 Å
• c: 11.975 ± 0.002 Å
• α: 80.67 ± 0.03°
• β: 75.67 ± 0.03°
• γ: 86.43 ± 0.03°
• Cell volume: 1494.1 ± 0.5 ų
• Cell temperature: 173 ± 2 K
• Ambient diffraction temperature: 173 ± 2 K
• Number of distinct elements: 4
• Space group number: 2
• Hermann-Mauguin space group symbol: P -1
• Hall space group symbol: -P 1
• Residual factor for all reflections: 0.0655
• Residual factor for significantly intense reflections: 0.0415
• Weighted residual factors for significantly intense reflections: 0.1028
• Weighted residual factors for all reflections included in the refinement: 0.1121
• Goodness-of-fit parameter for all reflections included in the refinement: 0.962
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No