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Information card for entry 4103405
Preview
| Coordinates | 4103405.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C20.92 H30 Hf I1.08 N0.92 O0.92 Si |
|---|---|
| Calculated formula | C20.9206 H30 Hf I1.0794 N0.9206 O0.9206 Si |
| SMILES | [Hf]123456789(I)([c]%10([Si]([c]%115[c]6([c]7([c]8([c]9%11C)C)C)C)(C)C)[cH]1[cH]2[c]3([cH]4%10)C(C)(C)C)N=C=O |
| Title of publication | Functionalization of Hafnium Oxamidide Complexes Prepared from CO-Induced N2 Cleavage |
| Authors of publication | Donald J. Knobloch; Emil Lobkovsky; Paul J. Chirik |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2010 |
| Journal volume | 132 |
| Pages of publication | 15340 - 15350 |
| a | 9.5359 ± 0.0005 Å |
| b | 24.7208 ± 0.0011 Å |
| c | 10.0763 ± 0.0005 Å |
| α | 90° |
| β | 109.167 ± 0.001° |
| γ | 90° |
| Cell volume | 2243.66 ± 0.19 Å3 |
| Cell temperature | 173 ± 2 K |
| Ambient diffraction temperature | 173 ± 2 K |
| Number of distinct elements | 7 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for all reflections | 0.0303 |
| Residual factor for significantly intense reflections | 0.0265 |
| Weighted residual factors for significantly intense reflections | 0.0641 |
| Weighted residual factors for all reflections included in the refinement | 0.0656 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.027 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4103405.html
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Users of the data should acknowledge the original authors of the
structural data.