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Information card for entry 4103545
Preview
| Coordinates | 4103545.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C43 H49 F4 N Si2 |
|---|---|
| Calculated formula | C43 H49 F4 N Si2 |
| Title of publication | High and Balanced Hole and Electron Mobilities from Ambipolar Thin-Film Transistors Based on Nitrogen-Containing Oligoacences |
| Authors of publication | Yi-Yang Liu; Cheng-Li Song; Wei-Jing Zeng; Kai-Ge Zhou; Zi-Fa Shi; Chong-Bo Ma; Feng Yang; Hao-Li Zhang; Xiong Gong |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2010 |
| Journal volume | 132 |
| Pages of publication | 16349 - 16351 |
| a | 7.6749 ± 0.0009 Å |
| b | 7.832 ± 0.001 Å |
| c | 17.134 ± 0.002 Å |
| α | 77.434 ± 0.005° |
| β | 88.437 ± 0.005° |
| γ | 84.073 ± 0.005° |
| Cell volume | 999.9 ± 0.2 Å3 |
| Cell temperature | 294 ± 2 K |
| Ambient diffraction temperature | 294 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.1772 |
| Residual factor for significantly intense reflections | 0.0964 |
| Weighted residual factors for significantly intense reflections | 0.2181 |
| Weighted residual factors for all reflections included in the refinement | 0.2661 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.194 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4103545.html
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