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Information card for entry 4104270
Preview
| Coordinates | 4104270.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C36.5 H40 Cl2 N5 O2 Ta |
|---|---|
| Calculated formula | C36.5 H40 Cl2 N5 O2 Ta |
| SMILES | [Ta]12(Cl)(Cl)(N(c3c(N1C(C)C)cc(OC)cc3)c1c(N2C(C)C)cc(OC)cc1)=NN=C(c1ccccc1)c1ccccc1.c1(ccccc1)C |
| Title of publication | One- and Two-Electron Reactivity of a Tantalum(V) Complex with a Redox-Active Tris(amido) Ligand |
| Authors of publication | Andy I. Nguyen; Karen J. Blackmore; Shawn M. Carter; Ryan A. Zarkesh; Alan F. Heyduk |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2009 |
| Journal volume | 131 |
| Pages of publication | 3307 - 3316 |
| a | 14.5899 ± 0.0006 Å |
| b | 15.5065 ± 0.0006 Å |
| c | 16.2442 ± 0.0007 Å |
| α | 80.14 ± 0.0005° |
| β | 73.7726 ± 0.0005° |
| γ | 87.8341 ± 0.0005° |
| Cell volume | 3476.3 ± 0.2 Å3 |
| Cell temperature | 103 ± 2 K |
| Ambient diffraction temperature | 103 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0234 |
| Residual factor for significantly intense reflections | 0.0189 |
| Weighted residual factors for significantly intense reflections | 0.0453 |
| Weighted residual factors for all reflections included in the refinement | 0.047 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.015 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4104270.html
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